光电薄膜沉积及其图案化 · Deposition and Pattern of Optoelectronic Films

新视界可在玻璃衬底、柔性PI 衬底和PEN 衬底上制备半导体、透明电极、金属电极、介电层和水氧阻隔层、有机功能层薄膜等,并可使用黄光制程和RIE、ICP 干法刻蚀,或湿法刻蚀进行微电路图形化,广泛应用于显示、触摸屏、传感器、光学器件、电子器件等。

We can prepare semiconductors, transparent electrodes, metal electrodes, dielectric layers and water-oxygen barrier layers on various substrates. And we can pattern these films by photolithography, RIE, ICP dry etching or wet etching. The services are available for displays, touch panels, sensors, optical devices and other electric devices.

 

 

新视界根据客户要求定制薄膜的种类、规格、电路图形、叠层结构,并可进行多层薄膜的黄光图形化套刻加工。黄光线可提供最小线宽5μm,套刻精度1μm 的加工能力,并可以使用湿法刻蚀、RIE 或ICP 干刻刻蚀进行图形化。

The specifications, patterns and structures of all kinds of films could becustomized. The film stacks can be patterned by photolithography while the minimum linewidth is 5μm and the alignment accuracy is 1μm. The films can be patterned by wet etching, RIE or ICP dry etching.

 

 

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